Surface Technology, Coating

Citations to U.S. patents by U.S. patents granted in 2023

Other WIPO fields: [ Computer technology  |  Digital communication  |  Electrical machinery, apparatus, energy  |  Measurement  |  Audio-visual technology  |  Medical technology  |  Optics  |  Transport  |  Semiconductors  |  Telecommunications  |  Other special machines  |  Pharmaceuticals  |  Organic fine chemistry  |  Mechanical elements  |  Chemical engineering  |  Engines, pumps, turbines  |  Civil engineering  |  Control  |  Basic materials chemistry  |  Handling  |  Furniture, games  |  Machine tools  |  Biotechnology  |  Other consumer goods  |  Macromolecular chemistry, polymers  |  IT methods for management  |  Textile and paper machines  |  Basic communication processes  |  Surface technology, coating  |  Materials, metallurgy  |  Environmental technology  |  Thermal processes and apparatus  |  Analysis of biological materials  |  Food chemistry  |  Micro-structural and nano-technology ]

  *1. 6 4956582    Low temperature plasma generator with minimal RF emissions
  Inventors:  Roger J. Bourassa

  *1. 6 5807470    Apparatus for coating substrates in a vacuum
  Inventors:  Joachim Szczyrbowski; Gotz Teschner

  *1. 6 6017221    Process depending on plasma discharges sustained by inductive coupling
  Inventors:  Daniel L. Flamm

  *1. 6 6252354    RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control
  Inventors:  Kenneth Collins; Craig Roderick; Douglas Buchberger; John Trow; Viktor Shel

  5. (5) 5 5217561    Laminating apparatus
  Inventors:  Noriyoshi Ueda; Kimiaki Hayakawa

  5. (5) 5 6893521    Double-side lamination system
  Inventors:  Naotaka Sasaki; Shunichi Kawamata; Kenji Sugaya; Hideaki Ito

  *5. 5 10157729    Soft pulsing
  Inventors:  John C. Valcore, Jr.

  *5. 5 10231321    State-based adjustment of power and frequency
  Inventors:  John C. Valcore, Jr.; Bradford J. Lyndaker

  *5. 5 10354838    RF antenna producing a uniform near-field Poynting vector
  Inventors:  Hema Swaroop Mopidevi; Lee Chen; Thomas W. Anderson

  *5. 5 10685810    RF antenna producing a uniform near-field Poynting vector
  Inventors:  Hema Swaroop Mopidevi; Lee Chen; Thomas W. Anderson

  *5. 5 10844514    Open Czochralski furnace for single crystal growth
  Inventors:  Yu Wang; Weiming Guan; Zhenxing Liang

  *5. 5 10879043    Device intrinsically designed to resonate, suitable for RF power transfer as well as group including such device and usable for the production of plasma
  Inventors:  Antonio Franco Selmo

  *5. 5 4284489    Power transfer network
  Inventors:  Harold J. Weber

  *5. 5 4887005    Multiple electrode plasma reactor power distribution system
  Inventors:  J. Kirkwood H. Rough; Peter W. Rose

  *5. 5 5121067    Directional sampling bridge
  Inventors:  Robert A. Marsland

  *5. 5 5687679    Multiple nanolayer coating system
  Inventors:  Richard S. Mullin; William P. Allen; Maurice L. Gell; Richard H. Barkalow; Allan A. Noetzel; John W. Appleby; Abdus S. Khan

  *5. 5 5989999    Construction of a tantalum nitride film on a semiconductor wafer
  Inventors:  Timothy E. Levine; Ling Chen; Mei Chang; Roderick C. Mosely; Karl A. Littau; Ivo Raaijmakers

  *5. 5 6125905    Protective coverings
  Inventors:  Margaret Mary Woodside; Frank Joseph Macdonald; Jeri Oliver Clark; Joseph Martine Lehman; Scott Alan Calvert

  *5. 5 9455126    Arrangement for plasma processing system control based on RF voltage
  Inventors:  John C. Valcore, Jr.; Henry S. Povolny

  *5. 5 9607810    Impedance-based adjustment of power and frequency
  Inventors:  John C. Valcore, Jr.; Bradford J. Lyndaker

  *5. 5 9620337    Determining a malfunctioning device in a plasma system
  Inventors:  John C. Valcore, Jr.; Bradford J. Lyndaker; Arthur Sato

  *5. 5 9675716    Microwave plasma sterilisation system and applicators therefor
  Inventors:  Christopher Paul Hancock

  *5. 5 9711724    Mask and mask assembly
  Inventors:  Dae Won Baek

  *5. 5 9779196    Segmenting a model within a plasma system
  Inventors:  John C. Valcore, Jr.; Arthur M. Howald

  1. (7) 68 7611751    Vapor deposition of metal carbide films
  Inventors:  Kai-Erik Elers

  2. (3) 66 9455138    Method for forming dielectric film in trenches by PEALD using H-containing gas
  Inventors:  Atsuki Fukazawa; Hideaki Fukuda; Noboru Takamure; Masaru Zaitsu

  *2. 66 7651955    Method for forming silicon-containing materials during a photoexcitation deposition process
  Inventors:  Joseph M. Ranish; Kaushal K. Singh

  *4. 65 7601652    Method for treating substrates and films with photoexcitation
  Inventors:  Kaushal K. Singh; Sean M. Seutter; Jacob Smith; R. Suryanarayanan Iyer; Steve G. Ghanayem; Adam Brailove; Robert Shydo; Jeannot Morin

  5. (1) 64 7754621    Process for producing zirconium oxide thin films
  Inventors:  Matti Putkonen

  5. (3) 64 9895715    Selective deposition of metals, metal oxides, and dielectrics
  Inventors:  Suvi P. Haukka; Raija H. Matero; Eva Tois; Antti Niskanen; Marko Tuominen; Hannu Huotari; Viljami J. Pore; Ivo Raaijmakers

  *5. 64 10186420    Formation of silicon-containing thin films
  Inventors:  Atsuki Fukazawa

  *5. 64 5950925    Reactant gas ejector head
  Inventors:  Yukio Fukunaga; Hiroyuki Shinozaki; Kiwamu Tsukamoto; Masao Saitoh

  *5. 64 6379466    Temperature controlled gas distribution plate
  Inventors:  Turgut Sahin; Salvador Umotoy; Avi Tepman; Ronald Lloyd Rose

  *5. 64 6825134    Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow
  Inventors:  Kam S. Law; Quanyuan Shang; William R. Harshbarger; Dan Maydan; Soo Young Choi; Beom Soo Park; Sanjay Yadav; John M. White

  *5. 64 7049226    Integration of ALD tantalum nitride for copper metallization
  Inventors:  Hua Chung; Nirmalya Maity; Jick Yu; Roderick Craig Mosely; Mei Chang

  *5. 64 7473655    Method for silicon based dielectric chemical vapor deposition
  Inventors:  Yaxin Wang; Yuji Maeda; Thomas C. Mele; Sean M. Seutter; Sanjeev Tandon; R. Suryanarayanan Iyer

Plasma Processing: Plasma processing techniques continue to dominate the landscape, with several top-cited patents focusing on advancements in plasma generation and control.

• US Patent No. 4956582 ("Low temperature plasma generator with minimal RF emissions") by Bourassa and US Patent No. 6017221 ("Process depending on plasma discharges sustained by inductive coupling") by Flamm demonstrate foundational concepts in plasma generation and control.


• US Patent No. 10157729 ("Soft pulsing") by Valcore, Jr. and US Patent No. 10231321 ("State-based adjustment of power and frequency") by Valcore, Jr. et al. highlight the importance of advanced plasma control techniques for achieving precise and uniform coatings.

• US Patent No. 9455138 ("Method for forming dielectric film in trenches by PEALD using H-containing gas") by Fukazawa et al. demonstrates the continuous refinement of ALD processes for the deposition of high-quality thin films.


• US Patent No. 7601652 ("Method for treating substrates and films with photoexcitation") by Singh et al. highlights the importance of photoexcitation techniques in enhancing CVD processes and enabling the deposition of novel materials.

• US Patent No. 5687679 ("Multiple nanolayer coating system") by Mullin et al. underscores the importance of multilayer coatings for achieving specific functional properties, such as improved wear resistance and corrosion protection.


• US Patent No. 9895715 ("Selective deposition of metals, metal oxides, and dielectrics") by Haukka et al. highlights the need for precise control over film deposition to achieve desired material properties and device performance.

• US Patent No. 6017221 ("Process depending on plasma discharges sustained by inductive coupling") by Flamm and US Patent No. 6252354 ("RF tuning method for an RF plasma reactor using frequency servoing and power, voltage, current or DI/DT control") by Collins et al. highlight the importance of plasma control and optimization for achieving desired surface properties.


• US Patent No. 10354838 ("RF antenna producing a uniform near-field Poynting vector") by Mopidevi et al. and US Patent No. 10685810 ("RF antenna producing a uniform near-field Poynting vector") by Mopidevi et al. demonstrate advancements in plasma generation and delivery, enabling more precise and uniform surface treatments.

• US Patent No. 5687679 ("Multiple nanolayer coating system") by Mullin et al. and US Patent No. 5989999 ("Construction of a tantalum nitride film on a semiconductor wafer") by Levine et al. highlight the importance of ALD techniques for depositing thin films with precise control over thickness and composition.


• US Patent No. 9455138 ("Method for forming dielectric film in trenches by PEALD using H-containing gas") by Fukazawa et al. and US Patent No. 10186420 ("Formation of silicon-containing thin films") by Fukazawa demonstrate advancements in plasma-enhanced ALD (PEALD) for improved film quality and deposition rates.

• US Patent No. 7611751 ("Vapor deposition of metal carbide films") by Elers and US Patent No. 9895715 ("Selective deposition of metals, metal oxides, and dielectrics") by Haukka et al. highlight the development of novel materials with enhanced properties for applications in electronics, energy, and other fields.

Note: This article is based on the provided list of patents and may not be exhaustive.

#SurfaceTechnology #Coating #PlasmaProcessing #ALD #CVD #ThinFilms #MaterialsScience #Innovation #IPStrategy #PatentAnalysis #TechnologyLaw #IntellectualProperty

References:
Raw data from: U.S. Patent and Trademark Office. "Data Download Tables." PatentsView. Accessed September 7, 2024. https://patentsview.org/download/data-download-tables.

Please contact me (carlos@candeloro.net) for methodology, or if you know or believe information presented is not correct.