Surface Technology, Coating

Citations to U.S. patents by U.S. patents granted in 2024

  1. 7 10439170    Multi-layer mask
  Inventors: I-Yi Lin

  2. 6 11502223    Epitaxial oxide materials, structures, and devices
  Inventors: Petar Atanackovic

  2. 6 8881676    Mask frame assembly for thin film deposition
  Inventors: Jeremy Hong

  2. 6 9192959    Mask frame assembly for thin film deposition
  Inventors: Jeremy Hong

  5. 5 10392813    Panel and method for manufacturing panels
  Inventors: Pol Lombaert; Matthias Wyseur; Tim Vanderhaegen

  5. 5 10663857    Mask and fabrication method thereof
  Inventors: Shouhua LV; Baojun Li

  5. 5 11053090    Document scanner with envelope discrimination and detection
  Inventors: Marc Noviello; Jeremy Jowers

  5. 5 11489090    Epitaxial oxide field effect transistor
  Inventors: Petar Atanackovic

  5. 5 11739423    Atomic layer deposition apparatus for coating on fine powders
  Inventors: Jing-Cheng Lin; Jung-Hua Chang; Ta-Hao Kuo; Chia-Cheng Ku

  5. 5 5217561    Laminating apparatus
  Inventors: Noriyoshi Ueda; Kimiaki Hayakawa

  5. 5 6893521    Double-side lamination system
  Inventors: Naotaka Sasaki; Shunichi Kawamata; Kenji Sugaya; Hideaki Ito

  5. 5 7946326    Automatic sheet laminating apparatus and automatic sheet laminating method
  Inventors: Bin-Tao Lee; Jiang Wu; Xiao-Xiong Wei

  5. 5 8549807    Floor panel and methods for manufacturing floor panels
  Inventors: Laurent Meersseman; Martin Segaert; Bernard Thiers; Benjamin CLEMENT; Christophe Maesen

  1. 67 7754621    Process for producing zirconium oxide thin films
  Inventors: Matti Putkonen

  2. 65 10047435    Dual selective deposition
  Inventors: Suvi Haukka; Raija H. Matero; Eva Tois; Antti Niskanen; Marko Tuominen; Hannu Huotari; Viljami Pore

  2. 65 7611751    Vapor deposition of metal carbide films
  Inventors: Kai-Erik Elers

  2. 65 8956971    Selective formation of metallic films on metallic surfaces
  Inventors: Suvi Haukka; Antti Niskanen; Marko Tuominen

  2. 65 9455138    Method for forming dielectric film in trenches by PEALD using H-containing gas
  Inventors: Atsuki Fukazawa; Hideaki Fukuda; Noboru Takamure; Masaru Zaitsu

  6. 64 6143082    Isolation of incompatible processes in a multi-station processing chamber
  Inventors: Edward J. McInerney; Thomas M. Pratt; Shawn Hancock

  6. 64 8173554    Method of depositing dielectric film having Si-N bonds by modified peald method
  Inventors: Woo Jin Lee; Kuo-wei Hong; Akira Shimizu; Deakyun Jeong

  8. 63 10014212    Selective deposition of metallic films
  Inventors: Shang Chen; Toshiharu Watarai; Takahiro Onuma; Dai Ishikawa; Kunitoshi Namba

  8. 63 10186420    Formation of silicon-containing thin films
  Inventors: Atsuki Fukazawa

  8. 63 7084060    Forming capping layer over metal wire structure using selective atomic layer deposition
  Inventors: Toshiharu Furukawa; Steven J. Holmes; David V. Horak; Charles W. Koburger, III

  8. 63 8119527    Depositing tungsten into high aspect ratio features
  Inventors: Anand Chadrashekar; Raashina Humayun; Michal Danek; Aaron R. Fellis; Sean Chang

  8. 63 9129897    Metal silicide, metal germanide, methods for making the same
  Inventors: Viljami Pore; Suvi Haukka; Tom E. Blomberg; Eva Tois

  8. 63 9911595    Selective growth of silicon nitride
  Inventors: David Charles Smith; Dennis M. Hausmann

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