1. 44 8728956
Plasma activated conformal film deposition
Inventors: Adrien LaVoie; Shankar Swaminathan; Hu Kang; Ramesh Chandrasekharan; Tom Dorsh; Dennis M. Hausmann; Jon Henri; Thomas Jewell; Ming Li; Bryan Schlief; Antonio Xavier; Thomas W. Mountsier; Bart J. van Schravendijk; Easwar Srinivasan; Mandyam Sriram 2. 41 5916365
Sequential chemical vapor deposition
Inventors: Arthur Sherman 2. 41 6270572
Method for manufacturing thin film using atomic layer deposition
Inventors: Yeong-kwan Kim; Sang-in Lee; Chang-soo Park; Sang-min Lee 2. 41 7651959
Method for forming silazane-based dielectric film
Inventors: Atsuki Fukazawa; Jeongseok Ha; Nobuo Matsuki 5. 40 6534395
Method of forming graded thin films using alternating pulses of vapor phase reactants
Inventors: Christiaan J. Werkhoven; Ivo Raaijmakers; Suvi P. Haukka 6. 39 6428859
Sequential method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)
Inventors: Tony P. Chiang; Karl F. Leeser 6. 39 7297641
Method to form ultra high quality silicon-containing compound layers
Inventors: Michael A. Todd; Keith D. Weeks; Christiaan J. Werkhoven; Christophe F. Pomarede 6. 39 7482247
Conformal nanolaminate dielectric deposition and etch bag gap fill process
Inventors: George D. Papasouliotis; Raihan M. Tarafdar; Ron Rulkins; Dennis M. Hausmann; Jeff Tobin; Adrianne K. Tipton; Bunsen Nie; Wai-Fan Yau; Brian G. Lu; Timothy M. Archer; Sasson Roger Somekh 6. 39 7622369
Device isolation technology on semiconductor substrate
Inventors: Woo Jin Lee; Atsuki Fukazawa; Nobuo Matsuki 10. 38 6287965
Method of forming metal layer using atomic layer deposition and semiconductor device having the metal layer as barrier metal layer or upper or lower electrode of capacitor
Inventors: Sang-bom Kang; Hyun-seok Lim; Yung-sook Chae; In-sang Jeon; Gil-heyun Choi 10. 38 6448192
Method for forming a high dielectric constant material
Inventors: Vidya S. Kaushik 10. 38 6511539
Apparatus and method for growth of a thin film
Inventors: Ivo Raaijmakers 10. 38 7582555
CVD flowable gap fill
Inventors: Chi-I Lang; Judy H. Huang; Michael Barnes; Sunil Shanker 10. 38 7989365
Remote plasma source seasoning
Inventors: Soonam Park; Soo Jeon; Toan Q. Tran; Jang-Gyoo Yang; Qiwei Liang; Dmitry Lubomirsky 10. 38 8187679
Radical-enhanced atomic layer deposition system and method
Inventors: Eric R. Dickey; William A. Barrow 10. 38 9564312
Selective inhibition in atomic layer deposition of silicon-containing films
Inventors: Jon Henri; Dennis M. Hausmann; Bart J. van Schravendijk; Shane Tang; Karl F. Leeser |