Surface Technology, Coating

Citations to U.S. patents by U.S. patents granted in 2021

Related WIPO fields:[Other special machines | Materials, metallurgy | Semiconductors | Electrical machinery, apparatus, energy | Basic materials chemistry | Macromolecular chemistry, polymers | Chemical engineering]  All WIPO fields

  1. 8 5453124    Programmable multizone gas injector for single-wafer semiconductor processing equipment
  Inventors: Mehrdad M. Moslehi; Cecil J. Davis; Robert T. Matthews

  2. 4 4177306    Laminated sectional girder of fiber-reinforced materials
  Inventors: Ralf-Thilo Schulz; Klaus Brunsch; Ludwig Lemmer

  2. 4 4311766    Release coatings
  Inventors: John A. Mattor

  2. 4 4606961    Discretely stiffened composite panel
  Inventors: Victor A. Munsen; John P. Ruane

  2. 4 4999215    Method for manufacturing polyimide thin films by plasma polymerization
  Inventors: Yoshiro Akagi; Mariko Ishino; Atsuhisa Inoue; Shigeru Kaminishi; Hiroshi Taniguchi

  2. 4 5614575    Sprayable polyurethane compositions
  Inventors: Rex R. Kotschwar

  2. 4 5950925    Reactant gas ejector head
  Inventors: Yukio Fukunaga; Hiroyuki Shinozaki; Kiwamu Tsukamoto; Masao Saitoh

  2. 4 6261408    Method and apparatus for semiconductor processing chamber pressure control
  Inventors: Gerhard Schneider; Andrew Nguyen

  2. 4 6585933    Method and composition for inhibiting corrosion in aqueous systems
  Inventors: William C. Ehrhardt; Longchun Cheng; Dawn Stasney; Kim A. Whitaker

  2. 4 7431747    Cutting tool and method of reducing the width of wear mark on a cutting tool
  Inventors: Hans-Wilm Heinrich; Gunter Röder; Günther Häupl

  2. 4 8549807    Floor panel and methods for manufacturing floor panels
  Inventors: Laurent Meersseman; Martin Segaert; Bernard Thiers; Benjamin CLEMENT; Christophe Maesen

  2. 4 9406485    Argon and helium plasma apparatus and methods
  Inventors: Siu F. Cheng; Thomas Scott Williams; Toby Desmond Oste; Sarkis Keshishian; Robert F. Hicks

  2. 4 9695508    Liner assembly for chemical vapor deposition chamber
  Inventors: David K. Carlson; Mehmet Tugrul Samir; Nyi O. Myo

  1. 40 7754621    Process for producing zirconium oxide thin films
  Inventors: Matti Putkonen

  2. 39 6387207    Integration of remote plasma generator with semiconductor processing chamber
  Inventors: Karthik Janakiraman; Kelly Fong; Chen-An Chen; Paul Le; Rong Pan; Shankar Venkataraman

  3. 37 8328939    Diffuser plate with slit valve compensation
  Inventors: Soo Young Choi; John M. White

  3. 37 9455138    Method for forming dielectric film in trenches by PEALD using H-containing gas
  Inventors: Atsuki Fukazawa; Hideaki Fukuda; Noboru Takamure; Masaru Zaitsu

  5. 36 6148761    Dual channel gas distribution plate
  Inventors: Robert B. Majewski; Yeh-Jen Kao; Yen-Kun Wang

  5. 36 7611751    Vapor deposition of metal carbide films
  Inventors: Kai-Erik Elers

  5. 36 8083853    Plasma uniformity control by gas diffuser hole design
  Inventors: Soo Young Choi; John M. White; Qunhua Wang; Li Hou; Ki Woon Kim; Shinichi Kurita; Tae Kyung Won; Suhail Anwar; Beom Soo Park; Robin L. Tiner

  5. 36 9786491    Formation of SiOCN thin films
  Inventors: Toshiya Suzuki; Viljami Pore

  9. 35 5413813    CVD of silicon-based ceramic materials on internal surface of a reactor
  Inventors: Richard W. Cruse; Veronika Ann Szalai; Terence J. Clark; Stephen Rohman; Robert M. Mininni

  9. 35 5558717    CVD Processing chamber
  Inventors: Jun Zhao; Tom K. Cho; Charles Dornfest; Stefan Wolff; Kevin Fairbairn; Xin Sheng Guo; Alex Schreiber; John M. White

  9. 35 6086677    Dual gas faceplate for a showerhead in a semiconductor wafer processing system
  Inventors: Salvador P. Umotoy; Lawrence Chung-Lai Lei; Anh N. Nguyen; Steve H. Chiao

  9. 35 7084060    Forming capping layer over metal wire structure using selective atomic layer deposition
  Inventors: Toshiharu Furukawa; Steven J. Holmes; David V. Horak; Charles W. Koburger, III

  9. 35 8728956    Plasma activated conformal film deposition
  Inventors: Adrien LaVoie; Shankar Swaminathan; Hu Kang; Ramesh Chandrasekharan; Tom Dorsh; Dennis M. Hausmann; Jon Henri; Thomas G. Jewell; Ming Li; Bryan Schlief; Antonio Xavier; Thomas W. Mountsier; Bart J. van Schravendijk; Easwar Srinivasan; Mandyam Sriram

  9. 35 8956971    Selective formation of metallic films on metallic surfaces
  Inventors: Suvi Haukka; Antti Niskanen; Marko Tuominen

  9. 35 9129897    Metal silicide, metal germanide, methods for making the same
  Inventors: Viljami Pore; Suvi Haukka; Tom E. Blomberg; Eva Tois

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